We use RF sputtering technique to deposit silicon oxide at a set heater
temperature of about 120C. To obtain the right crystal structure, the sputtered
oxide is annealed in oxygen atmosphere for 8 hours at a temperature of 600C. The
target that we are using now is from TMI, (Target Materials, INC), USA.
Hope this will help.
Han-Woo Chong
RMIT University
Melbourne, Australia
>>> mems-talk-request@memsnet.org 07/10/03 02:00am >>>
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Today's Topics:
1. RE: Making holes in Pyrex glass wafers? (Carsten Wesselkamp)
2. MEMS Safe and arm (vinh.pham@ffi.no)
3. Re: platinum on SU-8 (Chen-Han Lee)
4. sputtered silicon oxide (Torsten Kie?ling)
----------------------------------------------------------------------
Message: 1
Date: Wed, 9 Jul 2003 09:08:01 +0200
From: "Carsten Wesselkamp"
Subject: RE: [mems-talk] Making holes in Pyrex glass wafers?
To: "General MEMS discussion"
Cc: propak@singnet.com.sg
Message-ID:
Content-Type: text/plain; charset="iso-8859-1"
Plan Optik GmbH in Germany produces glass (e.g. Pyrex) wafers with holes.
The wafers can be from 100 microns (thickness) up to 5000 microns. The wafer
size can be from 1" to 12". The minimum hole diameter is approximately 500
microns (there is no maximum hole diameter). For that a newly developped,
numerically controlled, ultrasonic drilling process (so called USHD) is
used.
More information can be found at http://www.planoptik.com/page-engl/77.html
Carsten Wesselkamp
Plan Optik GmbH
mailto:c.wesselkamp@planoptik.com
-----Original Message-----
From: Bill Flounders [mailto:bill@eecs.berkeley.edu]
Sent: Monday, July 07, 2003 6:03 PM
To: General MEMS discussion
Subject: Re: [mems-talk] Making holes in Pyrex glass wafers?
Alternate Ultrasonic Machining Contact:
Perhaps related?
J.A. Anderson Associates
Precision Glass/Ceramics and Ultrasonic Machining
630-377-6565
john@jaanderson.com
www.jaanderson.com
Bill Flounders, Ph.D.
Technology Manager
Berkeley Microlab
Kirt & Erika Zipf-Williams wrote:
>>Hi, We are looking for supplier who can drill more than 1 mm holes on
>
> thick
>
>>(1 mm) Pyrex glass wafers. Please write to propak@singnet.com.sg Regards.
>
>
> Check with Sensor Prep Services in Illinois at 630-365-9645.
> They do ultrasonic drilling through even thicker glass.
>
> --Kirt Williams, Ph.D. consultant
>
>
> _______________________________________________
> MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
------------------------------
Message: 2
Date: Wed, 9 Jul 2003 09:23:45 +0200
From:
Subject: [mems-talk] MEMS Safe and arm
To:
Message-ID:
Content-Type: text/plain; charset="iso-8859-1"
Hi all.
Anyone got an idea of how to make an Safe and Arm(S/A)
mechanism in weapon system based on MEMS. All input is appreciated.
Regards
VP
------------------------------
Message: 3
Date: Wed, 9 Jul 2003 10:19:49 +0100
From: "Chen-Han Lee"
Subject: Re: [mems-talk] platinum on SU-8
To: "General MEMS discussion"
Message-ID: <003201c345fb$3ef7a230$875abc93@universip4jv8r>
Content-Type: text/plain; charset="iso-8859-1"
Hi everyone,
Thank you all for your help
regards,
derek
----- Original Message -----
From: "Mighty Platypus"
To: "General MEMS discussion"
Sent: Monday, July 07, 2003 10:25 PM
Subject: Re: [mems-talk] platinum on SU-8
> Hi Derek,
> Either matel will make a fine adhesion layer. Of the Cr and Ti, Ti tends
> to have a lower stress, but it is susceptible to HF.
>
> Jesse Fowler
> UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
> Los Angeles, CA 90095-1597 | (310)825-3977
> "Observations of nature, no matter how seemingly arcane, are like
> peeling off one more layer from the great onion of knowledge"
> -- Don Petit, ISS science officer
>
> On Mon, 7 Jul 2003, Chen-Han Lee wrote:
>
> > Hi everyone,
> >
> > thank you all especially Kirk and Bob,
> > you mention a adhesive layer for sputter platinum on silicon wafer
> > what material should i use? Will Ti or Cr do the job?
> > One more question, can i sputter gold on silicon wafer?
> >
> > Derek
> > 7/7/03
> >
> > ----- Original Message -----
> > From: "Kirt & Erika Zipf-Williams"
> > To: "General MEMS discussion"
> > Sent: Thursday, July 03, 2003 7:25 PM
> > Subject: Re: [mems-talk] platinum on SU-8
> >
> >
> > > > Good day everyone,
> > > > I am a research student in U.K.
> > > > Could anyone please tell me wome ways i can deposite platinum film
on
> > > SU-8?
> > > > Any suggestions are welcomed.
> > > > Thank you for your time.
> > > > Chen-Han Lee
> > >
> > > You can sputter or evaporate platinum.
> > > Don't forget to use an adhesion layer.
> > >
> > > --Kirt Williams, Ph.D. consultant
> > >
> > >
> > > _______________________________________________
> > > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> > > options, visit
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> > > Hosted by the MEMS Exchange, providers of MEMS processing services.
> > > Visit us at http://www.memsnet.org/
> > >
> >
> >
> > _______________________________________________
> > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS processing services.
> > Visit us at http://www.memsnet.org/
> >
>
>
> _______________________________________________
> MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>
------------------------------
We use RF sputtering technique to deposit silicon oxide at a set temperature of
about 120C. To obtain the right crystal structure, the sputtered oxide is
annealed in oxygen atmosphere for 8 hours at a temperature of 600C. The target
that we are using now is from TMI, (Target Materials, INC), USA.
Hope this will help.
Message: 4
Date: Wed, 9 Jul 2003 15:41:28 +0200
From: Torsten Kie?ling
Subject: [mems-talk] sputtered silicon oxide
To:
Message-ID:
Content-Type: text/plain; charset="iso-8859-1"
Dear all,
does somebody know how to sputter silicon oxide films at low temperature for
a dielectric coating. Is there some literature available? Doe somebody know
a supplier of targets?
Any help is highly appreciated.
Best regards in advance
-------------------------------------------
Dipl.-Ing. Torsten Kießling
Fraunhofer Institute
Photonic Micro Systems
Grenzstr. 28
D-01109 Dresden
Tel.: +49(0)351/8823-283
Fax: -266
email: torsten.kiessling@ipms.fhg.de
Internet: http://www.ipms.fhg.de/
-------------------------------------------
------------------------------
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End of MEMS-talk Digest, Vol 9, Issue 13
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