I am surprised that your SiO2 target will not provide acceptable results. Are
you using DC magnetron or RF sputter power? I believe only RF will give you the
results you are looking for. A more promising way would be to use PECVD oxide
instead of sputter. You will have better control over the film stress and this
will lead to better adheasion properties. We can provide you with PECVD films on
a contract basis if you want to contact me directly.
Bob Henderson
Trion Technology
480-968-8818 x 11