Dear community

I'd like to use SiO2 as an wet etch mask in TMAH, but TMAH does etch SiO2. What
I want to do is etch whole Si except membrane which is spun on Si. So, much
thick SiO2 is needed.

1) How much %wt TMAH is preferred? Only TMAH or mix with other chemicals?

2) How much thickness of SiO2 is needed to persist in TMAH during Si etching?

3) Etch time and temperature of TMAH which is corresponding to 2)?



Sincerely,

---------------------------------------------------------
Byunghoon Bae

Visiting scholar
Mechanical & Industrial Engineering
Univesity of Illinois at Urbana-Champaign
26 MEB MC-244
1206 W. Green St. Urbana, IL 61801
Tel: 1-217-244-7301, Fax: 1-217-244-6534
E-mail: bhbae@uiuc.edu

Ph. D. candidate
Dept. of Mechatronics
Kwangju Inst. of Science and Technology(K-JIST)

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