> ------------------------------

Dear Burkhard,

You might be interested in,

M. J. Nobes, J. S. Colligon and G. Carter, "The Equilibrium Topography of
Sputtered Amorphous Solids," Journal of Materials Science, Vol. 4, pp.
730-733, 1969.

G. Carter, J. S. Colligon and M. J. Nobes, "The Equilibrium Topography of
Sputtered Amorphous Solids II," Journal of Materials Science, Vol. 6, pp.
115-117, 1971.

G. Carter, J. S. Colligon and M. J. Nobes, "The Growth of Topography During
Sputtering of Amorphous Solids," Journal of Materials Science, Vol. 8, pp.
1473-1481, 1973.

M. Cantagrel, "Considerations on High Resolution Patterns Engraved by Ion
Etching," IEEE Transactions on Electron Devices, Vol. ED-22, No. 7, July
1975.

It's not quite RIE, but a lot of the same considerations hold.

Best regards,
Jordan

--
Jordan M. Berg, Ph.D., P.E.
Associate Professor
Department of Mechanical Engineering
Texas Tech University
Lubbock, TX 79409-1021
806-742-3563
jordan.berg@coe.ttu.edu


> Message: 2
> Date: Fri, 29 Aug 2003 14:21:53 +0200
> From: "Burkhard Volland" 
> Subject: [mems-talk]     First Reactive ion etching profile
> simulators/simulations
> To: 
> Message-ID:
> <01c36e28$21c03e20$1da3338d@teph-pc29.physik.uni-kassel.de>
> Content-Type: text/plain;    charset="iso-8859-1"
>
> Dear colleques,
>
> I am just reading some papers on profile simulations for reactive ion
> etching.
> I was wondering who were the first groups working on, and which were the
> first papers published on this topic.
> I have the papers by Ulacia, Petti and McVittie
> from 88/89, and papers by Reynolds, Neureuther and Oldham
> [J.Vac.Sci.Technol 16(6), 1979] and by N.S. Viswanathan [J.Vac.Sci.Technol.
> 16(2), 1979].
> I was wondering if there were any earlier papers about the profile
> simulation of RIE (reactive ion etching).
> If you know of (or just remember vaguely) some earlier or just early such
> papers, could you tell me some bibliographic informations?
>
> Both Reynolds et al. and Viswanathan make reference to a paper by Jewett,
> Hagouel, Neureuther, and Van Duzer (Polymer Eng. Sci. 17, 1977) (V. makes
> reference to the conference talk), however, in the context of the string
> algorithm. Unfortunately, I don't have access to this journal. Does this
> paper by Jewett et al. deal with  reactive ion etching profile simulations,
> or is it "just" about algorithms and isotropic etching?
>
>
> Thanks a lot in advance!
>
> Burkhard
>
>
>
> ------------------------------
>