Yilei,
Try a single wafer Oxygen + CF4 plasma reaction. What size are your
samples and how many. I may be able to test them free for you. Contact me
directly. Bill Moffat
-----Original Message-----
From: Yilei Zhang [mailto:ylzhang@iastate.edu]
Sent: Thursday, October 02, 2003 3:01 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] photoresist remove
Dear Members:
I have some samples with photoresist (AZ5209) coating for a long time, now i
cannot
remove it by aceton, stripper, or ultrasonic cleaner. Can anyone give me some
suggestions? Thanks.
Regards,
Yilei Zhang
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