A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Wet etch Gu with Sulfuric acid/hydrogen peroxide
Wet etch Gu with Sulfuric acid/hydrogen peroxide
2003-12-01
Z.,W.Y.(Lydia)
2003-12-03
Kirt Williams
Wet etch Gu with Sulfuric acid/hydrogen peroxide
Kirt Williams
2003-12-03
Is Gu element 107, or do you mean a residue of goo on your wafer?
If it's the latter, you can mix sulfuric acid and hydrogen peroxide
anywhere from 1:1 to 3:1 to 5:1 to 60:1.
High-peroxide solutions are self-heating.
Low-peroxide solutions are used commercially, with a bath
of sulfuric acid held at 120 C and a small amount of hydrogen peroxide added
just before wafer cleaning.

    --Kirt Williams, Ph.D.    consultant

----- Original Message -----
From: "Z.,W.Y.(Lydia)" 
To: "General MEMS discussion" 
Sent: Monday, December 01, 2003 8:08 AM
Subject: [mems-talk] Wet etch Gu with Sulfuric acid/hydrogen peroxide


> Dear all,
>
> Can I wet etch Gu with Sulfuric acid/hydrogen peroxide? What is the
mixture
> ratio and temperature? Thanks!
>
> Lydia
>
> -------------------------------------------------
> This mail sent through IMP: http://horde.org/imp/
>
> _______________________________________________
> MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Mentor Graphics Corporation
Harrick Plasma, Inc.
Nano-Master, Inc.
MEMS Technology Review