Dear MEMS community,
in order to increase the surface roughness of our etched silicon pieces, I would
like to introduce IPA (isopropylic alcohol) into our KOH etching system. In
previous postings I already read that IPA is usually floating on the KOH etching
solution and only a small part actually dissolves in KOH. In one posting I read
that the amount of IPA is not that important as long as a layer of IPA is
floating.
My question is: Why can it then be read so often in literature sources that 4
parts of water are brought together with 1 part of IPA? Isn't that by far too
much IPA floating on the KOH or does that issue from another reason?
I would gratefully appreciate any comment regarding my request.

Yours sincerely

Thomas Schmidt
INESC Porto
Portugal