Dear All,
I am a student of M.Tech in IIT Kanpur and i am working in the field of
electronic materials.
I have to etch gold and nickel, but the microetchant should not affect the
negative photoresist (SC100).The film deposited is
Silicon (substrate) / Nickel / Gold / photoresist(during pattering). I have used
aquaregia (aquaregia:water :: 1:2 ) for 5 min.,for the microetching of both
nickel and gold but it stripped away the photoresist only.
What should i do now.
Thanking You
Your's Sincerely
Hare Krishna
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