Hi,
I have a Nickel structure built on Si substrate using electroless plating. I
was wondering what etchant I could use to etch Si without attacking Ni so
that the Ni structure can be released from the Si substrate.
I'm thinking about using KOH. Does anybody know if KOH will attack Ni? If
so, what is the etch rate? Are there any other choices of etchants (e.g.,
EDP, HNA)?
Thanks!
Best Regards,
Qing Yao
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M&IE @ UIUC