Hi,
I was wondering if some one could tell me the typical value of refraction
index of LPCVD Silicon Dioxide. It is deposited at about 420 degrees
centigrade on a silicon wafer. I use a focus ellipsometer to measure its
thickness. I tried 1.46 but got very large fit error (about 500). Please let
me know if you have any information about this. Thanks!
Best Regards,
Qing Yao
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M&IE @ UIUC