Clariant's AZ nLOF series of materials provides a negative slope lift off
profile, and is strippable in AZ300T or 400T, which are both NMP based(although
the 400T contains TMAH, which may be a problem), and in AZ Kwik Strip
(dipropylene glycol monomethyl ether [34590-94-8];
tetrahydrothiophene-1,1-dioxide [126-33-0]; polyglycol ether; water), which is
said to be safe for copper.
Best Regards,
Chad Brubaker
EV Group invent * innovate * implement
Technology - Tel: 480.727.9635, Fax: 480.727.9700 e-mail:
c.brubaker@EVGroup.com, www.EVGroup.com
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-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On
Behalf Of xpeng@EECS.Berkeley.EDU
Sent: Thursday, September 23, 2004 1:24 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] negative photoresist
Hi,
I am trying to do liftoff of chrome on top of a copper seed layer using a
negative photoresist. Can someone suggest a neagative photoresist that can be
stripped off with a solution that doesn't damage the copper?
Thanks.
Jack
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