Presuming you're not looking for the answers to a homework assignment
then you should go talk to Bob Parsons, a prof. at UBC and an expert on
sputter.
That said, no you probably don't want to sputter in pure O2, the sputter
yield of O2 vs. a heavier element (Ar for example) wouldn't be
impressive.
Beyond that you haven't mentioned your equipment setup, is it DC, pulsed
DC, RF? Any secondary activation? Magnetron? Metal or oxide target?
-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of ypy0816
Sent: Tuesday, December 07, 2004 11:26 AM
To: mems-talk@memsnet.org
Subject: Spam:[mems-talk] How to sputtering ZnO
Hi,
Does anyone know how to sputtering ZnO?
I sputter ZnO using pure O2, is that right?
I get 400nm~500nm thickness after sputtering one hour.
Sincerely,
Jacob Yeh
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