SiH4 and O2 certainly will explode if the concentrations are
sufficiently high. For APCVD SiH4 and O2 both diluted with N2 are
commonly used. For LPCVD a less reactive oxidizer, such as N2O is
usually preferred. If the reactor is a tube furnace, injector tubes and
caged boats are used for the so-called "LTO" process to overcome
reactant depletion.
Roger Shile
-----Original Message-----
From: Liu X.F.
Subject: [mems-talk] deposite SiO2
i plan to deposite SiO2 by LPCVD employing SiH4 and O2 as
precursors,but i wonder whether the mixture of SiH4 and O2 will explode
at high temperature?
SiH4+2O2---SiO2+2H2O (1)
SiH4+O2---SiO2+2H2 (2)
Thanks
anodle