You can use a BARC.
-----Original Message-----
From: Parijat Bhatnagar
Subject: [mems-talk] Non-photoactive resist
Dear Group,
1) I am looking for an organic resist-like material which can form a 200 to
1500 nm thick coating by spinning. It should not dissolve in water or
developer.
2) I also want to protect it from dissolving when I would spin the
photoresist on it.
Shipley's FSC-M or MicroChem MX 6C are two such material but I am not able
to locate the datasheets for it on the internet or the company's web-site.