Subject: [mems-talk] Wet Etchant for silicon nitride
Avi Laker
2005-11-21
a wet etchant for silicon nitride used quite a bit is hot phosphoric =
acid.=20
usually done in a reflux reactor. it is masked with sio2 and does bot
etch silicon.
avi
Message: 3
Date: Sat, 19 Nov 2005 17:17:35 -0800
From: "Roger Brennan"
Subject: [mems-talk] Wet Etchant for silicon nitride
To: "General MEMS discussion"
Message-ID:
Content-Type: text/plain; charset=3D"iso-8859-1"
Concentrated HF is the only etchant I know that removes silicon nitride
without much damage to silicon. However conc HF is much too slow. Is =
there
an etchant that removes nitride quickly but does not harm silicon?