Hello,
I would like some advice on plasma ashing on AlGaAs/ GaAs.
A Ti/Au metal lift off seems to have left some aggressive photoresist
(AZ 4214) residue (at least that's what I think the black stuff is) on the
AlGaAs
surface, which won't get removed with Acetone/IPA.
I am considering an oxygen plasma clean up, but unsure if that would change
the
surface chemistry in anyway. What should be the ashing conditions, and do I
need
additional cleaning steps before proceeding with citric/peroxide selective
etching?
Thank you,
Sabarni Palit
Duke University, Durham NC