Dear all
I'm wet etching quartz with a BHF solution 6:1, but I have encounterd some
difficulties in etching.
What I do is a photolithographic process on the quartz substrate, a hardbake of
4 hours at 180° and then the wet etching process.
What I obtain though is the rearrangement of the photoresist in a disordered
pattern and no etching!
Has anyone an idea where I go wrong?
Barbara