Hi all,
I am trying to pattern a film of polyvinyl
alcohol(PVA) on Si wafer.
Process steps are:
- Preparation of %4 aqeous PVA solution ( I also have
problems with this, can't obtain homogenous
solution)
- Spin-coat of PVA solution @2000 RPM
- Soft bake for 30min @90 C
- AZ1823 PR spin-caoting
- Soft bake for 1 min @90 C
- Exposure of PR and development
- Etching of PVA in DI water for 15 sec
- Drying of substrate and hard-bake for 30 min @140 C
( heat treatment makes PVA insoluble in water again
)
- Removal of PR in Acetone. This step demages the
substrate, surface becomes white and bloats . I tried
different hard-bake times but nothing changed.
Thank you for your help in advance,
Mustafa Celik
Uludag University
Electrical and Electronics Eng. Dep.
Bursa/Turkey
Mustafa Celik
Uludag University
Electrical and Electronics Eng. Dep.
Bursa/Turkey