May be 1000 ml H2O, 100g NH4F and 2ml H2O2 mixture. I think SiO2 is not
etched by NH4F alone. Nitric, HF acetic system would not work because HF
attacks the glass.
~~~~~~~~~~~~~~~~~~~
Dr. Alex Freeman
Engineering Manager, Etch Group
Ball Semiconductor, Inc.
Ph:972-359-2442
Fax:972-359-2413
afreeman@ballsemi.com
~~~~~~~~~~~~~~~~~~~
> ----------
> From: Chelly Narayana[SMTP:chelly@lucent.com]
> Sent: Monday, July 20, 1998 1:51 PM
> To: MEMS@ISI.EDU
> Subject: isotropic silicon etchant
>
> I am looking for a wet chemical etching solution that etches silicon
> isotropically and does not attack glass. If anyone out there know of
> any
> means of doing this, please send me a mail to chelly@lucent.com
>
> Thanks,
> Chellappan
>
>
>