Hi,
I have fabricated SiO2 rectangular block on top of carbon surface.
This was done by RIE etching the SiO2 and using the photoresist as the mask.
After removing the resist, I find some sort of thin layer of something
(resist residue?) on carbon surface at the carbon-SiO2 interface.
I am not sure what this is.
I am wondering if anyone has seen this themselves and if so how I can
remove it.
I thought about putting the wafer in Tepla and blasting with oxygen..but
then this would remove the carbon as well...
Thanks in advance...
Mike
_________________________________________________________________
http://newlivehotmail.com