On 10/19/07, Xiaoguang Liu wrote:
> Hi Sven
>
> Could you be more specific with your etching condition? Like your mask
> material, HF concentration etc?
>
Leo,
I have tried several different combinations, but the masking was
successful using the following conditions:
Masklayer: chromium/gold (10/500nm). 2,1 micrometer positive
photoresist was left for the etching (I am not too sure about the
thickness.)
HF: 50% - not diluted.
No agitation was used (earlier I have used ultrasonication, but this
seems to worsen the masking ability of the gold).
The result was the bad etching I described earlier.
regards,
Sven