Dear MEMS community:
Does anyone know how fast a high power ICP plasma system can
anisotropically etch tungsten (etch rate in microns per minute)? What
was the gas mixture used? What was the mask material(s) used.
Richard Koba
Foster-Miller, Inc.
195 Bear Hill Road
Waltham, MA 02451-1003
781-684-4197
fax: 781-290-0693