Hello folks,
I'm trying to do Si deep RIE with AZ9260 photoresist as a mask in a
PlasmaTherm etcher.
Any good recipe for AZ9260 PR?
The recipe I used was as follows.
1. AZ9260 spun at 2000 rpm for 60s (~11um)
2. 110C 5 min softbake
3. 540mJ/cm2 exposure
4. AZ 421K developer ~3min
5. No hardbake.
The smallest feature size is 20 un wide lines.
The mask would barely hold up to 200 cycles of etching.
Thanks
TK