Hi all, does anyone know if Moiré patternes have been used for alignment of mask patterns to (111) planes on (110) wafers ? On (110) wafers I would realize a pre-etch in order to define the (111) planes, then i would use Moirè patterns for a fine alignment of the mask features to the (111) planes. I presume that someone has already done this job but i can not find any paper. Is there any suggestion ? Best regards, Andrea