David Menche wrote:
> We are using chrome as a hard mask to dry etch SiO2.
> What is a good chrome echant that will not attack the photo resist, nor
> SiO2, and what kind of etch rate is expected. tried potassium
> permaginate/potassium hudroxide solution, and find it is very slow at
> chrome etch, and fast at dissolving the resist.
>
> thanks dave menche
>
Hello,
we have used for submicron wet etching of Cr
(approx. 100nm Cr / 1 min):
165g (NH4)2Ce(NO3)6, 43ml 70% HClO4
+fill up to 1 liter destilated H2O
Best regards,
Ivan Kostic
Tel. +421.7.5941.2557,-.2006,-.3573
http://ups.savba.sk/ebl
___________Bratislava_________________