Hi,
Does anybody have experience using Ma-N 440 negative resist and TMA238WA
developer? I am trying to create enclosed holes with Ma-N 440 resist, but have
to use the alternative TMA238WA rather than the designated developer from MRT.
I would like to develop 4 micron holes with 5 micron thick resist. But, I could
not fully develop the features across the wafer. Can anybody comment on this?
Thanks a lot!
Yingtao