Sputtered oxide as KOH anisotropic wet etching mask
Morrison, Richard H., Jr.
2012-02-13
Sputtered oxide will not work, it is not the same chemically as thermal
oxide.
Rick
-----Original Message-----
From: mems-talk-bounces+rmorrison=draper.com@memsnet.org
[mailto:mems-talk-bounces+rmorrison=draper.com@memsnet.org] On Behalf Of
JJ HU
Sent: Saturday, February 11, 2012 1:26 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Sputtered oxide as KOH anisotropic wet etching mask
Hello everyone,
I am planning to perform some KOH anisotropic wet etching of silicon to
create V-grooves with ~ 1 um width, and for that I am wondering if I may
use sputtered oxide as the etch mask. I have seen a lot of papers using
thermal oxide but I would like to see if sputtered oxide would work as
well, since I have easy access to a sputtering station. Any advice would
be very much appreciated!
Thank you in advance,
JJ