The active component in CD-26 is TMAH and the rest of it is mostly
water. You can pick any TMAH based developer. The only difference will
be the concentration so your develop rates will change. For example,
AZ300MIF, MF-319,
On Thu, Jun 13, 2013 at 7:44 PM, Jocelyn Ng wrote:
> Dear all,
>
> I'm currently using MF CD-26 developer as my general photoresist developer in
lithography process.
> Does anyone out there know is there any chemical that is equivalent to this
CD-26?
> Any thoughts or comments are much appreciated.
>
> Thank you.
>
> Best Regards,
> Jocelyn
>
> Sent from my iPhone
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