Hi ALL,
I wonder if anyone of you have used oxide dry etch tools from STS. Could
anyone give me a good suggestion on the hard mask you have tried?
Currently I am considering to etch 2.5um oxide with the feature size of
300nm, therefore the aspect ratio is as high as 1:8. I have tried a-Si but
the selectivity is also only 1:4 under this feature size. I am using C4F8
as the etching gas, with H2 for polymerization.
Any comment will be welcome. Thanks!!
Best,
Youmin
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