Dear James Cotsell,
You might wish to read the following paper:
Uyehata, S.G. and E.S. Kolesar, Jr., "Micromachined Silicon Surfaces
for Maximizing Optical Absorption at 632.8 nm," Journal of
Micromechanics and Microengineering, Vol. 1, No. 3, pp. 171-181,
September 1991.
Best regards,
Ed Kolesar
____________________________________________________
Edward S. Kolesar, PhD, P.E., W.A. Moncrief Professor of Engineering
Texas Christian University
Department of Engineering
TCU Box 298640
Fort Worth, TX 76129
Telephone: (817) 257-6226 (office & voice mail)
(817) 257-7126; -7677 (secretary)
Telefax: (817) 257-7136
E-mail: e.kolesar@tcu.edu
WWW: http://www.engr.tcu.edu
_____________________________________________________________
> ----------
> From: james cotsell
> Reply To: james cotsell;mems-cc@ISI.EDU
> Sent: Monday, February 15, 1999 10:44 PM
> To: MEMS@ISI.EDU
> Subject: Pyramid formation
>
> Dear researchers,
>
> I am currently trying to form pyramids on silicon wafers for use in the
> manufacture of solar cells (texturing). My process at the moment
> involves a dip in concentrated KOH followed by immersion in a 10% KOH
> solution containing isopropanol. While this works ocasionally It often
> doesn't and I was wondering if anyone can help me with making the
> methind more reliable.
>
> Any information on the anisotropic etching of silicon would also be
> appreciated, particularly on the chemistry of the whole procedure.
>
> Thanks in advance,
>
> James Cotsell
>
>