You will not get streaky and uneven coating if you use 'closed bowl cover'
during coating. I do not know though, do you have this features into your
coating system or not?
Best Regards,
Rafiqul Islam
EV Group Inc.- Technology- Tel: (602) 437 9492 x 118, (602)2842134
(cell),Fax: (602) 437 9435,
e-mail: R.Islam@EVGroup.com web: www.EVGroup.com
-----Original Message-----
From: Alok Paranjpye [mailto:alokp@engineering.ucsb.edu]
Sent: Tuesday, January 15, 2002 2:48 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] AZ4620 problems
I have a requirement for a thick (~6+ um) positive resist layer. I've been
trying to use AZ4620 at 4000 rpm for this purpose, but it always gives me
an uneven, streaky coating, with the streaks running in the radial
direction on the wafer. I have tried ramping the spin rate to avoid this,
but the streaks remain. If anybody has had a similar experience, and could
help me out, it would be great. Alternately, I'd appreciate any
suggestions for another resist that could give me a thick coat, and could
be exposed on an i-line stepper.
Thanks
Alok Paranjpye
Graduate Student
University of California,
Santa Barbara
_______________________________________________
mems-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/