>I am trying to deposit about 50 Microns of Sio2 on Si and want a very
> flat surface profile. Can some one suggest an appropriate method for >it?
Sounds like a case for flame hydrolysis deposition.
Google will give you many suppliers.
best regards,
klaus
(TEEL) Tokyo Electron Europe Limited
PVD Process Support (ex MRC)
Klaus Beschorner Tel +49-7033-45683
Drosselweg 6 Fax +49-7033-45631
71120 Grafenau, Germany Mobile +49-174 315 7754