Michael,
Metal lift off with positive resist but a negative resist mask is done
using an ammonia technique that neutralizes the exposed resist and flood
exposure allows the resist that was originally unexposed to be developed away.
This is a mature process and can be done down to 800 Angstrom lines and spaces
and with up to 40 micron resist thickness. These are only results that have
been attained to date and are by no means the limits. There are numerous
papers on this technique. If you need further information on this let me
know, it lets you do lift off using the masks for negative resist, as a common
start is to reverse the field of the mask to start with positive resist. Bill
Moffat
-----Original Message-----
From: Michael D Martin [mailto:michael.martin@louisville.edu]
Sent: Friday, March 22, 2002 6:59 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Lift off with negative resist?
Does anyone know of a resist/ technique that will allow me to do
lift-off with a negative resist?
Thanks in advance,
Mike
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