Well, with wet processing, you can use ALEG-355 from Mallincrodt Baker. It
works quite well. Dry, I would try RIE O2 plasma, but it seems like that
would do something to the chrome.
Jesse Fowler
UCLA/MAE Dept., 420 Westwood Plaza, Room 18-121, ENGR IV
Los Angeles, CA 90095-1597 | (310)825-3977
"Battery is safe if not provoked." -- _Batteries in a Portable World_
On Tue, 26 Mar 2002, Mike Tippetts wrote:
> I am currently trying to commision a TePla 300 Plasma processor for the use
> in removing photoresist from devices after RIE but I am left with small
> residues which are impossible to remove. What are the best resist removal
> conditions and how can the temperature be kept as low as possible? Also is
> there any way to strip resist from chrome without removing the chrome as
> well.
>
> Mike Tippetts
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