3000A Cr was deposited by thermal evaporation on top
of SiO2 surface, and kept on table top for 3 month. Cr
layer peels off when DI water is squirted onto the
surface from wherever water touches. Can you suggest
any possible causes? Contact surface was supposedly
clean because I handed new clean wafers to this person
who did evaporation, but I don't know what kind of
effort was made to clean them further. Cr layer was ok
right after deposition, 3 month ago.
Thank you.
-Soojin
Yahoo! Tax Center - online filing with TurboTax
http://taxes.yahoo.com/