On Wed, 17 Apr 2002, Venubabu.U wrote:
Hi,all:
Can someone tell me the polysilicon wet etchant having good
selectivity with Positive PR and less undercutting.
Presently iam using HNA etchant(HF:HNO3:WATER :: 6:100:40).
Iam realising some cantilevers with this etchant,iam getting the
width of beam at the top is less compare to the bottom.
I want uniform width from top to bottom.
Any information is gratefully appreciated.
venu babu,
Research scholar,
IIT MADRAS, INDIA.
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