Dear all,
I am looking for a RIE process of Chromium.
Do you know if it is possible to etch Cr only with SiCl4?
And what are typically the parameters (etch rate, flow, rf Pwer W/cm2
pressure, bias ).
Thanks a lot
David
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David PEYRADE
LPN-CNRS
route de Nozay
91460 Marcoussis
FRANCE
Tel: 01 69 63 61 25
Fax: 01 69 63 60 06
Mobile: 06 82 17 57 91
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