Dear all,
in many applications, e.g. Ti-Ni-Au bond pads, pure Nickel
is replaced with a Nickel(93%)Vanadium(7%) alloy.
Even in publications from the early 80s, all I can find is
the reference that "Vanadium is added to make the nickel non-magnetic
while retaining similar properties to pure nickel as a thin film."
NiV is much easier to deposit by magnetron sputtering.
Can anybody point me to some original publications comparing
properties of the two materials as thin films ? Or mention any
other differences in the application, apart from the higher
resistivity of NiV (60 vs. 20 uOhmcm) ?
thanks
klaus
--
(TEEL) Tokyo Electron Europe Limited
PVD Process Support (ex MRC)
Klaus Beschorner Tel +49-7033-45683
Drosselweg 6 Fax +49-7033-45631
71120 Grafenau, Germany Mobile +49-174 315 7754