Hi, MEMS researchers
I am do some nano feature on the Au and Cr layer. wet etching will introduce
too much overetching. I am not sure i can use CF4 or SF6 gas to etching Au
and Cr or nor if i use PMMA as mask. if ok, would you like to tell etch
rate?
Thanks
Dlee
Research Asistant
UT At Austin
512-2323521
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