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MEMSnet Home: MEMS-Talk: photoresist (Shipley series) thinning using low rate oxygen plasma RIE
photoresist (Shipley series) thinning using low rate oxygen plasma RIE
2003-01-08
Wei Wei
photoresist (Shipley series) thinning using low rate oxygen plasma RIE
Wei Wei
2003-01-08

Hi, all;

I try to use low oxygen plasma to thin my photoresist layer. If anybody
have experience on this? Can you provide a receipe to control the
etching rate under 100nm/min?

Thanks,

Alex



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