Hello,
I've read recent and not-so-recent papers that describe the good
planarization provided by spinning photoresist HPR204 (a low viscosity
resist). To avoid characterizing another material for such an
application, I am interested in obtaining some of this resist. My
searches for a supplier were fruitless, and I wonder if anyone may be
able to help.
Thanks
Robert Mihailovich
Rockwell Science Center
Thousand Oaks, CA