Hi,
   I am trying to etch a doped poly layer (n+) of 0.5
microns thickness and a multilayered stack consisting
of Oxide, Nitride and Oxide (30 120 30)nm in
thickness. So how do I etch the layers anisotropically
and also ensure that I have etched the last oxide
completely. I had problems with RIE of under/over etch
with my recipe. So if anyone can suggest a recipe it
helps a lot.
  Thanks,
  Murty.

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