Hello,
I am trying to find an anisotropic silicon etchant which also
doesn't attack Aluminum.
I was told that TMAH doesnot attack Al. I tried etching under the
following conditions.
Concentration - TMAH 25% - rest water.
Temperature - 80C and also at 100C.
The Aluminum was removed under less than 15 mins. I would like any
information from about the etch conditions and also any other etchant
suitable for the purpose.
Thank You in advance,
Nandakumar.
--
K.Nandakumar. Tel : (216) 368 4109 (Lab)
2504, Derbyshire Rd, #2, (216) 371 6746 (res)
Cleveland, OH 44106. Fax: (216) 368 2668.