I am having difficulty doing lift-off of Shipley 1813 resist from glass
following electron beam evaporation of Ti/Au. The evaporation follows
standard photolithographic UV exposure and developing. The lift-off
protocol I am using is sonication in acetone. Out of frustration I have
even soaked the sample in nanostrip for an hour to no avail. Any advice
would be appreciated.



Tim Meehan
Superfine Group
Department of Chemistry
University of North Carolina
@ ChapelHill