A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Photopatterning
Photopatterning
2003-02-25
sandhya sandhya
2003-02-27
Abhinav Bhushan
2003-03-10
David Nemeth
2003-03-09
Zbigniew P. Sobczak
Photopatterning
Zbigniew P. Sobczak
2003-03-09
Dear Sandhya:

It is recommended to employ Negative Resist NR9-8000 from Futurrex in this
application. NR9-8000 develops away from 500 µm deep through-holes. Positive
resists do not perform in this application.

Sincerely,

Zbigniew P. Sobczak
Futurrex, Inc.
T: 973-209-1563
E-mail: zpsobczak@futurrex.com
www.futurrex.com
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMS Technology Review
University Wafer
MEMStaff Inc.
Mentor Graphics Corporation