depending on Piranha concentration, you may expect etch rate >10
micron/minute..
for diluted solution, like H2SO4:H202(30%):H2O=1:8:80 the etch rate is ~0.8
micron/minute..
        Mike

> -----Original Message-----
> From: Kim, GunWoo [SMTP:gunwookim@lps.umd.edu]
> Sent: Friday, March 07, 2003 14:45
> To:   MEMS-talk@memsnet.org
> Subject:      [mems-talk] Piranha cleaning on the GaAs wafer
>
> Dear all,
> Have you experienced to use a Piranha cleaning step with GaAs wafer?
> I want to know how much attack (surface roughening or etc) will be on
> the GaAs wafer after the Piranha cleaning step.
> Please, anyone would you let me know any information about that?
> Thank you very much
>
> Gunwoo Kim
>
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