Christian,
In the May 1, 1995 Applied Physics Letter # 66 shows my publication on
TiO2 films using dc reactive magnetron sputtering.  I used O2/Ar (1.8mT
/ 3.2mT partial pressures) and a 20cm Ti target using 5kw of power and
got a 130A/min rate.  This should give you plenty of information.

Brent Garber
garber@engr.uconn.edu