Dear Community,

We have purchased a TRION Phantom etcher for etching fused silica and are having
some difficulties with selectivity of photoresist and a roughening of the etched
surface.  Does anyone have expierience with this etcher using CHF3 and O2 for
the etching of silicon dioxide?

Eric

Eric G. Johnson, PhD
Assistant Professor of Optics
School of Optics/CREOL
University of Central Florida
P.O. Box 162700
4000 Central Florida Blvd
Orlando, FL 32816-2700
(407)823-6803
Fax 823-6880