Re: SV: [mems-talk] What is the etch rate of SU-8 in O2 plasma?
Nels P Ostrom
2003-03-17
Does anyone know if this is the same photo acid generator that is used in
HDMicrosystems 2720 series photodefinable polyimide? I see this same
grey-black powder after I etch 2721 with an O2 plasma. I have found that
the incorporation of 5-10% CF4 greatly reduces this residue but if your
process does not allow it, then I have also removed it after the RIE etch
with acetone in an ultrasound bath. I have been trying to figure out what
this residue is for the past few months, because according to
HDMicrosystems literature, the 2720 series should easily etch in an O2
plasma. I would greatly appreciate any comments from others that
understand the chemistry much better than I do. Thanks.
> The residues you see are Antimony and antimonyoxide. It has a grey to
> black powdery appearance. Usually it can be removed using ultrasound.
> The antimony comes from the photo acid generator in the SU-8 which
> is an antimony salt.
>
> Jacques Jonsmann
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