hi mems workers,

can we, by any means control the side wall angle in
etching the Si wafer with anisotropic KOH other than
that permitted by the (111) etch stop layers?

Also, can abyone let me know how we can get the
vertical walls by etching away with KOH?

Thanks and regards.

Ramji Dhakal
Binghamton, NY

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_________________________________________________________________Ramji Dhakal

M S Mechanical Engineering,
SUNY Binghamton, NY

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